发明名称 APPARATUS FOR PROCESSING SUBSTRATE
摘要 PURPOSE: A substrate processing device is provided to improve productivity by reducing energy and time to reheat a holder. CONSTITUTION: A plurality of rollers(120) are rotatably supported in a body. A holder(130) is supported by the roller and supports a substrate. A heater is located in the chamber and generates heat to process the substrate. The lower sides of a plurality of support pins(151) are located in the lower side of the body. The upper sides of the support pins are located in the chamber via the body and pass through the holder. The support pin is protruded to the upper side of the holder, supports the substrate and mounts the substrate on the holder by downwardly moving. If the substrate mounted on the holder is completely processed, the support pin is protruded to the upper side of the holder and separates the substrate from the holder by upwardly moving.
申请公布号 KR101297670(B1) 申请公布日期 2013.08.21
申请号 KR20110059804 申请日期 2011.06.20
申请人 发明人
分类号 H01L21/02;H01L21/683 主分类号 H01L21/02
代理机构 代理人
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