发明名称 Film-forming composition
摘要 <p>A film-forming composition in a solution form, comprising (A) a Silicone resin comprising SiO 2 units and R 3 SiO 1/2 units, wherein R is a C 1-6 monovalent hydrocarbon group, with a molar ratio of the R 3 SiO 1/2 units to the SiO 2 units ranging from 0.5 to 1.5, said silicone resin may comprise R 2 SiO and RSiO 3/2 units,provided that a total content of the R 3 SiO 1/2 units and the SiO 2 units is at least 80 mole % of all of the units, (B) an organopolysiloxane represented by the following formula (I), wherein R is a C 1-6 monovalent hydrocarbon group, R 1 is a monovalent group selected from the group consisting of C 1-6 monovalent hydrocarbon groups, a hydroxyl group, C 7-30 monovalent aliphatic hydrocarbon groups, -C 3 H 6 NH 2 and -C 3 H 6 NHC 2 H 4 NH 2 , R 2 is a C 7-30 monovalent aliphatic hydrocarbon group, R 3 is -C 3 H 6 NH 2 or -C 3 H 6 NHC 2 H 4 NH 2 , a is an averaged number ranging from 450 to 2950, b is an averaged number ranging from 50 to 1500, c is an averaged number ranging from 0 to 50, provided that a+b+c ranges from 500 to 3,000, and (C) an organic solvent. The composition forms a non-sticky and abrasion resistant film and is useful for cosmetics or drugs to protect the skin or hair.</p>
申请公布号 EP2028245(B1) 申请公布日期 2013.08.21
申请号 EP20080161442 申请日期 2008.07.30
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 MIYADAI, SHINJI;ONO, ICHIRO
分类号 C09D183/04;A61K8/02;A61K8/898 主分类号 C09D183/04
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