发明名称 |
METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE, SOLID-STATE IMAGING DEVICE AND IMAGING APPARATUS |
摘要 |
Also provided is a method for manufacturing a photoelectric conversion device including: a first process where a plurality of pixel electrodes 104 are formed on a dielectric layer 102; a second process where a light receiving layer 107 that includes an organic material is formed on the plurality of pixel electrodes 104; and a third process where a counter electrode 108 is formed on the light receiving layer 107, in which the first process comprises: a film forming process of a pixel electrode material on the dielectric layer 102; a patterning process of the film of the pixel electrode material; and a heating process for heating the substrate at 270° C. after the patterning process.
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申请公布号 |
US2013206966(A1) |
申请公布日期 |
2013.08.15 |
申请号 |
US201313851842 |
申请日期 |
2013.03.27 |
申请人 |
FUJIFILM CORPORATION;FUJIFILM CORPORATION |
发明人 |
MITSUI TETSURO;KURAMOTO YUKI |
分类号 |
H01L31/18;H01L27/146 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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