发明名称 METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE, SOLID-STATE IMAGING DEVICE AND IMAGING APPARATUS
摘要 Also provided is a method for manufacturing a photoelectric conversion device including: a first process where a plurality of pixel electrodes 104 are formed on a dielectric layer 102; a second process where a light receiving layer 107 that includes an organic material is formed on the plurality of pixel electrodes 104; and a third process where a counter electrode 108 is formed on the light receiving layer 107, in which the first process comprises: a film forming process of a pixel electrode material on the dielectric layer 102; a patterning process of the film of the pixel electrode material; and a heating process for heating the substrate at 270° C. after the patterning process.
申请公布号 US2013206966(A1) 申请公布日期 2013.08.15
申请号 US201313851842 申请日期 2013.03.27
申请人 FUJIFILM CORPORATION;FUJIFILM CORPORATION 发明人 MITSUI TETSURO;KURAMOTO YUKI
分类号 H01L31/18;H01L27/146 主分类号 H01L31/18
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