| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device and a layout data processing device which can uniformize the coverage of a pattern on a semiconductor substrate.SOLUTION: A layout data processing device 10 comprises: a layout pattern arrangement section 2 that arranges a layout pattern on a semiconductor substrate; a dummy pattern arrangement section 3 that uniformly arranges a dummy pattern, which is constituted by a plurality of unit dummy patterns, over an entire pattern arrangement area on the semiconductor substrate irrespective of a location where the layout pattern is arranged; a dummy pattern adjustment section 4 that performs adjustment for at least one of enlargement, reduction, and removal in at least part of the plurality of unit dummy patterns; and a timing verification section 5 that performs timing verification using the layout pattern and dummy pattern arranged on the semiconductor substrate after adjustment is performed by the dummy pattern adjustment section. |
