发明名称 |
DRAWING METHOD AND DRAWING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a drawing device capable of calculating a radiation value obtained by correcting a proximity effect with higher accuracy.SOLUTION: A drawing device 100 of one embodiment of this invention includes a radiation value calculation unit 112 for solving an equation of stored energy by backscattering of charged particle beams defined by a polynomial expression having secondary or more items of an irradiation amount to calculate an irradiation amount, and a drawing unit 150 for irradiating a sample 101 with an electron beam 200 with the calculated irradiation amount to draw a pattern thereon. According to the invention, drawing can be performed with an irradiation amount obtained by correcting a proximity effect with higher accuracy. |
申请公布号 |
JP2013157623(A) |
申请公布日期 |
2013.08.15 |
申请号 |
JP20130067231 |
申请日期 |
2013.03.27 |
申请人 |
NUFLARE TECHNOLOGY INC |
发明人 |
ABE TAKAYUKI;SHIBATA HAYATO;KATO YASUO;MATSUMOTO YASUSHI;YASHIMA JUN;IIJIMA TOMOHIRO;MOTOSUGI TOMOO;ONISHI TAKAYUKI;YASUSE HIROTO |
分类号 |
H01L21/027;G03F7/20;H01J37/305 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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