CRUCIBLE FOR VAPOR DEPOSITION, VAPOR DEPOSITION DEVICE, AND VAPOR DEPOSITION METHOD

摘要

Provided are a crucible for vapor deposition, a vapor deposition device, and a vapor deposition method that allow a film formation rate to be detected by a sensor during vapor deposition by means of proximity deposition. This crucible has: a storage section for storing a deposition source; a first guide path for guiding a gasified material, which is emitted from the deposition source, toward a substrate to be treated; a wall section for demarcating the first guide path; and a second guide path that diverges from a middle part of the first guide path and communicates with the outside through the wall section.