发明名称 SCHOTTKY BARRIER FORMATION
摘要 A method for Schottky barriers formation using laser radiation consists in preliminary application of metal salts to a barrier formation area on the surface of semiconductor material; the metal has electron work function providing formation of a rectifying contact with the semiconductor; thereafter, said region is processed by pulse laser radiation having energy providing heat anneal of the semiconductor material, with simultaneous application of electric field between the salt solution and semiconductor material.
申请公布号 UA82724(U) 申请公布日期 2013.08.12
申请号 UA20130002481U 申请日期 2013.02.27
申请人 YURII FEDKOVYCH CHERNIVTSI NATIONAL UNIVERSITY 发明人 HRYTSIUK BOHDAN MYKOLAIOVYCH;NICHYI SERHII VASYLIOVYCH;POLITANSKYI LEONID FRANYTSOVYCH
分类号 H01L23/32 主分类号 H01L23/32
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