发明名称 RETAINING RING MONITORING AND CONTROL OF PRESSURE
摘要 <p>A load cup apparatus for transferring a substrate in a processing system includes a pedestal assembly having a substrate support, an actuator, and a controller. The actuator is configured to move the pedestal assembly into a loading position in contact with a retaining ring of a carrier head and to generate a retaining ring thickness signal based on a distance travelled by the pedestal assembly. The controller is configured to receive the retaining ring thickness signal from the actuator.</p>
申请公布号 WO2013112764(A1) 申请公布日期 2013.08.01
申请号 WO2013US23026 申请日期 2013.01.24
申请人 APPLIED MATERIALS, INC. 发明人 CHEN, HUNG CHIH;OSTERHELD, THOMAS H.;GARRETSON, CHARLES C.;FUNG, JASON GARCHEUNG
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
主权项
地址