发明名称 |
FINFETS AND METHODS FOR FORMING THE SAME |
摘要 |
PURPOSE: FINFETs and methods for forming the same are provided to increase the resistance of an electrical fuse by reducing the height of the electrical fuse. CONSTITUTION: A gate dielectric (50) is formed on the sidewall of a semiconductor fin. A gate electrode (52) is formed on the gate dielectric. An isolation region includes a first part and a second part. The first part is formed on a part of the gate electrode. The second part is formed on the opposite side of the part of the gate electrode. |
申请公布号 |
KR20130086272(A) |
申请公布日期 |
2013.08.01 |
申请号 |
KR20120151914 |
申请日期 |
2012.12.24 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
MOR YI SHIEN;CHEN HSIAO CHU;CHIANG MU CHI |
分类号 |
H01L29/78;H01L21/336 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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