发明名称 FINFETS AND METHODS FOR FORMING THE SAME
摘要 PURPOSE: FINFETs and methods for forming the same are provided to increase the resistance of an electrical fuse by reducing the height of the electrical fuse. CONSTITUTION: A gate dielectric (50) is formed on the sidewall of a semiconductor fin. A gate electrode (52) is formed on the gate dielectric. An isolation region includes a first part and a second part. The first part is formed on a part of the gate electrode. The second part is formed on the opposite side of the part of the gate electrode.
申请公布号 KR20130086272(A) 申请公布日期 2013.08.01
申请号 KR20120151914 申请日期 2012.12.24
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 MOR YI SHIEN;CHEN HSIAO CHU;CHIANG MU CHI
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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