发明名称 |
ETCHING METHOD AND ETCHING LIQUID USED THEREIN |
摘要 |
<p>An etching method having the step of: applying an etching liquid to a substrate, the etching liquid containing: a fluorine ion, a nitrogen-containing compound having at least 2 of nitrogen-containing structural units, and water, the etching liquid having a pH of being adjusted to 5 or less; and etching a titanium compound in the substrate.</p> |
申请公布号 |
WO2013111907(A1) |
申请公布日期 |
2013.08.01 |
申请号 |
WO2013JP51936 |
申请日期 |
2013.01.22 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
MIZUTANI, ATSUSHI;TOMEBA, HISAMITSU;TAKAHASHI, KAZUTAKA;INABA, TADASHI |
分类号 |
C23F1/26;H05K3/06 |
主分类号 |
C23F1/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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