| 摘要 |
PURPOSE: A gas supplying head and a substrate processing apparatus are provided to suppress the generation of unnecessary sediments in the unintended region by sufficiently purging inside the gas expansion room. CONSTITUTION: A gas expansion room (101) is a linear shaped container. Multiple gas discharging holes (102) are arranged in a row corresponding to the gas expansion room. The first gas supplying inlet (103) is arranged at one end portion of the gas expansion room and is connected to the gas system which supplies gas within the gas expansion room. A gas exhausting port (104) is arranged at the other end portion of the gas expansion room and is connected to the gas ventilation system which exhausts the gas from the gas expansion room. |
