| 摘要 |
<p>Provided is a film formation apparatus that can efficiently form an anti-contamination film that can withstand actual use while also having improved abrasion resistance. A film formation apparatus (1) in which a substrate holder (12) that has a substrate holding surface for holding a plurality of substrates (14) is disposed rotatably within a vacuum vessel (10), said film formation apparatus (1) comprising: an ion source (38) mounted within the vacuum vessel (10) so as to have a configuration, position and orientation such that an ion beam can be radiated to an area that is a part of the substrate holding surface; and a vapor deposition source (34) and a control plate (36) that act as film formation means mounted within the vacuum vessel (10) so as to have a configuration such that the film formation material can be supplied to a region which is a part of the substrate holding surface and which overlaps at least a part of the ion beam radiation area irradiated by the ion source (38).</p> |
