发明名称 |
Scanning exposure apparatus, control apparatus and method of manufacturing device |
摘要 |
A scanning exposure apparatus includes a first feedback loop including a first controlled object including an original stage and controlling a position of the original stage, a second feedback loop including a second controlled object including a substrate stage and controlling a position of the substrate stage, and a feedback unit including a first calculator and feed backing a synchronization error between the original stage and the substrate stage to the first feedback loop and the second feedback loop via the first calculator, wherein a transfer function from a first target value for the first controlled object to a first controlled value of the first controlled object and that from a second target value for the second controlled object to a second controlled value of the second controlled object are equal, and the exposure is performed at least during a period in which the original and the substrate are accelerated. |
申请公布号 |
US8493551(B2) |
申请公布日期 |
2013.07.23 |
申请号 |
US20100892810 |
申请日期 |
2010.09.28 |
申请人 |
FUKAGAWA YOUZOU;HIRATA MITSUO;CANON KABUSHIKI KAISHA |
发明人 |
FUKAGAWA YOUZOU;HIRATA MITSUO |
分类号 |
G03B27/62;G03B27/42;G03B27/58 |
主分类号 |
G03B27/62 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|