发明名称 PROCESS FOR FORMING METAL FILM, AND PRODUCT EQUIPPED WITH METAL FILM
摘要 The purpose of the present invention is to provide a wiring substrate from which a metal film cannot be detached easily. A process for forming a metal film comprises a step (X) of applying an agent containing a compound (alpha) onto the surface of a base and a step (Y) of forming a metal film on the surface of the compound (alpha) by a wet-mode plating technique, wherein the compound (alpha) is a compound having either an OH group or an OH-generating group, an azide group and a triazine ring per molecule, and the base comprises a polymer.
申请公布号 US2013183534(A1) 申请公布日期 2013.07.18
申请号 US201113823526 申请日期 2011.09.30
申请人 MORI KUNIO;MATSUNO YUSUKE;KUDO TAKAHIRO;MICHIWAKI SHIGERU;MIYAWAKI MANABU;KUNIO MORI;MEIKO ELECTRONICS CO., LTD.;SULFUR CHEMICAL INSTITUTE INCORPORATED 发明人 MORI KUNIO;MATSUNO YUSUKE;KUDO TAKAHIRO;MICHIWAKI SHIGERU;MIYAWAKI MANABU
分类号 C23C18/20;C25D11/00 主分类号 C23C18/20
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