| 发明名称 |
ETCHING COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME |
| 摘要 |
An etching composition that includes, based on the total weight of the etching composition, from about 0.05% to about 15% by weight of a halogen-containing compound, from about 0.1% to about 20% by weight of a nitrate compound, from about 0.1% to about 10% by weight of an acetate compound, from about 0.1% to about 10% by weight of a cyclic amine compound, from about 0% to about 50% by weight of a polyhydric alcohol, and a remainder of water.
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| 申请公布号 |
US2013180947(A1) |
申请公布日期 |
2013.07.18 |
| 申请号 |
US201213588825 |
申请日期 |
2012.08.17 |
| 申请人 |
KIM IN-BAE;JEONG JAE-WOO;KIM SANG-GAB;PARK JI-YOUNG;CHOUNG JONG-HYUN;KIM SEON-IL;SONG YONG-SUNG;OH JONG-HYUN;SOULBRAIN CO., LTD.;SAMSUNG DISPLAY CO., LTD. |
发明人 |
KIM IN-BAE;JEONG JAE-WOO;KIM SANG-GAB;PARK JI-YOUNG;CHOUNG JONG-HYUN;KIM SEON-IL;SONG YONG-SUNG;OH JONG-HYUN |
| 分类号 |
C09K13/06;C09K13/00;H01B13/00 |
主分类号 |
C09K13/06 |
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