| 摘要 |
PROBLEM TO BE SOLVED: To shorten a time required for freezing of a liquid film and reduce a cooling cost required for freezing of the liquid film.SOLUTION: In a substrate processing apparatus 1, a substrate 9 is pre-cooled by a first liquid being cooler than a freezing point of a second liquid, then a liquid film of the second liquid is formed on a top surface 91 of the substrate 9, and the liquid film is cooled by a cooling gas from a freezer 4 to form a freezed film. Thereby the liquid film absorbs a heat of the substrate 9 and rise of temperature of the liquid film is suppressed. As a result, time required for freezing of the liquid film can be shortened. Even if the temperature of cooling gas from the freezer 4 is raised, the liquid film can rapidly be freezed, as compared with a case where the liquid film is formed and freezed without pre-cooling the substrate 9. Therefore heat insulation facilities such as a pipeline supplying the cooling gas from a cooling gas supplying source to a cooling gas nozzle 41, can be simplified. As a result, the cooling cost required for freezing the liquid film can be reduced. |
