发明名称 Substrate holding device, exposure apparatus, and device manufacturing method
摘要 A substrate holder PH includes a first holder PH1 which holds a substrate P, a liquid-repellent inner surface Tc of a plate member T which faces a side surface Pc of the substrate P held on the first holder PH1 via a predetermined gap A, and a chamfered portion C provided on an upper portion of the inner surface Tc. On the side surface Pc of the substrate P, a liquid-repellent area is provided, and the chamfered portion C is provided so as to face the liquid-repellent area of the substrate P held on the first holder PH1. Thereby, a substrate holding device which can restrain inflow of the liquid into the back surface side of the substrate is provided.
申请公布号 EP2426708(B1) 申请公布日期 2013.07.10
申请号 EP20110190907 申请日期 2006.03.20
申请人 NIKON CORPORATION 发明人 FUJIWARA, TOMOHARU;NAGASAKA, HIROYUKI
分类号 H01L21/687;H01L21/683 主分类号 H01L21/687
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