发明名称 |
METHOD FOR FORMING PHOTOCATALYST APATITE FILM |
摘要 |
<p>A method for forming a photocatalytic apatite includes a target production step (S12) for producing a sputtering target that contains photocatalytic apatite, and a sputtering step (S13) for forming a photocatalytic apatite film on a substrate by sputtering using the target. A firing step (S11) for firing the photocatalytic apatite is conducted before the sputtering step so as to increase the crystallinity of the photocatalytic apatite.</p> |
申请公布号 |
EP1577009(B1) |
申请公布日期 |
2013.07.10 |
申请号 |
EP20020790944 |
申请日期 |
2002.12.27 |
申请人 |
FUJITSU LIMITED |
发明人 |
ASO, NORIYASU;WAKAMURA, MASATO |
分类号 |
B01J27/00;B01J21/06;B01J21/16;B01J27/18;B01J35/00;B01J35/02;B01J37/00;B01J37/02;B01J37/34 |
主分类号 |
B01J27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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