| 摘要 |
PURPOSE: A substrate cartridge and a chemical vapor deposition apparatus including the same are provided to simultaneously deposit a lot of substrates by installing a plurality of substrate stages which are vertically separated. CONSTITUTION: A housing(110) has a cylindrical shape. The lower side of the housing is opened. A first slit(111a) and a second slit(111b) are formed on the side of the housing. A substrate stage unit(120) includes a substrate stage(121) on which a substrate is loaded. The substrate stage unit is inserted into or outputted from the housing. A wafer pocket(122) is formed on the upper side of the substrate stage. |
