| 摘要 |
PROBLEM TO BE SOLVED: To provide a conductive film formation method capable of forming a conductive film having low electrical resistance on a base material by utilizing optical burning even if heat resistance of the base material is low.SOLUTION: A conductive film formation method is a method for forming a conductive film 2 on a base material 1 and includes the steps of forming a coating film 3b made of copper fine particles 4 on the base material, optically burning the coating film 3b, and applying plating to an optically burned coating film 3c. As a result, the conductive film 2 can be formed on the base material 1 by reducing light irradiation energy in optical burning even if heat resistance of the base material is low. Since this conductive film 2 has a plating layer 21, its electrical resistance becomes low. |
