发明名称 CRADLE, WATER-REMOVING METHOD FOR SEMICONDUCTOR WAFER, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a cradle capable of achieving higher product yield of a semiconductor product than with a conventional cradle.SOLUTION: The cradle fitted to an inner peripheral surface of a rotating body of a spin dryer for using includes a bottom surface part 110 containing a bottom plate 111 on which a carrier leg 210 is placed and an opening part 112 which acts as a flow passage for air and water droplet, and a side surface part 120 containing a carrier side surface support part 121 for supporting a carrier side surface 220, and a void formation part which is positioned closer to the bottom surface side than to the carrier side surface support part 121, with an air inlet 123 provided, and capable of forming a void 124 which is to be a flow passage for air and water droplet in a portion between itself and the carrier side surface 210. The bottom surface part 110 is configured such that, when a carrier 200 is stored inside, only both ends 212 of the carrier leg part are placed on the bottom plate 111, and a portion 214 sandwiched between both ends 212 of the carrier leg part is exposed from the opening 112.
申请公布号 JP2013135127(A) 申请公布日期 2013.07.08
申请号 JP20110285432 申请日期 2011.12.27
申请人 SHINDENGEN ELECTRIC MFG CO LTD 发明人 FUKUDA YUSUKE;NAGASHIMA YUKITOSHI
分类号 H01L21/304 主分类号 H01L21/304
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