发明名称 |
ACTINIC RAY SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING SAID COMPOSITION, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an actinic ray sensitive resin composition which is excellent in exposure latitude and generates little scum, a resist film formed using the composition, and a pattern forming method using the composition, and to provide a method for manufacturing an electronic device and an electronic device.SOLUTION: An actinic ray sensitive resin composition contains (A) a resin having a repeating unit represented by the following general formula (1) and a repeating unit which is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound, represented by the following general formula (Z-1), which generates an acid by irradiation with an actinic ray. K represents a cyclic acid anhydride group, and A represents a cyclic organic group. |
申请公布号 |
JP2013130654(A) |
申请公布日期 |
2013.07.04 |
申请号 |
JP20110278800 |
申请日期 |
2011.12.20 |
申请人 |
FUJIFILM CORP |
发明人 |
YOSHITOME MASAHIRO;KATAOKA SHOHEI;SHIBUYA AKINORI;IWATO KAORU;SUGIYAMA SHINICHI;TANGO NAOHIRO;FUKUHARA TOSHIAKI;ITO JUNICHI;MATSUDA TOMOKI;TOKUGAWA YOKO |
分类号 |
G03F7/039;C08F8/12;C08F20/28;G03F7/004;G03F7/38;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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