发明名称 NON-VOLATILE MEMORY (NVM) AND LOGIC INTEGRATION
摘要 A method of forming an NVM cell and a logic transistor uses a semiconductor substrate. A metal select gate of the NVM cell is formed over a high-k dielectric as is metal logic gate of a logic transistor. The logic transistor is formed, including forming source/drains, while the metal select gate of the NVM cell is formed. The logic transistor is protected while the NVM cell is then formed including forming a charge storage region using metal nanocrystals and a metal control gate over a portion of the metal select gate and a portion of the charge storage region over the substrate. The charge storage region is etched to be aligned to the metal control gate.
申请公布号 US2013171785(A1) 申请公布日期 2013.07.04
申请号 US201213343331 申请日期 2012.01.04
申请人 SHROFF MEHUL D.;HALL MARK D. 发明人 SHROFF MEHUL D.;HALL MARK D.
分类号 H01L21/8239 主分类号 H01L21/8239
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