| 摘要 |
PROBLEM TO BE SOLVED: To improve the strength of the mask member of an inductive coupling type plasma processing apparatus with a plurality of linear slits for preventing the blocking of the feed of high frequency by a conductive film caused by metal atoms formed on the surface of a dielectric window.SOLUTION: The mask member 50 is mounted to the face directed into the treatment chamber of the dielectric window of the inductive coupling type plasma processing apparatus. The mask member has a plurality of linear slits 503, 504 for sticking metal atoms scattered from a processing object during plasma processing only to a part of the dielectric window in such a manner that the conductive film to be formed on the face by sticking the metal atoms to the face of the dielectric window has a shape of intercepting the flow of an electric current induced within the conductive film on the way by the action of a high frequency magnetic field generated by a coil electrode, and any slit is not located on the straight line same as that of the other slit. |
