发明名称 SYSTEM AND METHOD FOR PROVIDING THERMAL MANAGEMENT OF AN OBSCURED LASER SYSTEM
摘要 According to an embodiment of the disclosure, a system for providing thermal management of an obscured laser system is provided that includes a primary mirror, a secondary mirror, and a plurality of energy redirectors. The primary mirror is configured to reflect beam energy for the laser system. The secondary mirror is configured to function as a limiting aperture for the laser system and is aligned on-axis with respect to the primary mirror. The energy redirectors are each configured to redirect energy away from a corresponding obscuration and out of the laser system.
申请公布号 US2013170228(A1) 申请公布日期 2013.07.04
申请号 US201113339219 申请日期 2011.12.28
申请人 TAYLOR BYRON B.;PALMER ERIC M.;JENKINS DAVID G.;RAYTHEON COMPANY 发明人 TAYLOR BYRON B.;PALMER ERIC M.;JENKINS DAVID G.
分类号 F21V29/00 主分类号 F21V29/00
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