发明名称 METHOD OF PRODUCING POLYMER THIN FILM HAVING MICROSTRUCTURE AND PATTERN SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a polymer thin film having a pattern with coexisted regions each consisting of regular patterns having different periods on a substrate surface or a pattern having a distribution in periods of regular patterns, which is formed by a micro-phase separation of a polymer block copolymer.SOLUTION: A method of producing a polymer thin film includes a step of arranging a polymer layer containing a polymer block copolymer composition on the surface of a substrate, and separating the micro-phase of the polymer layer. The substrate surface has patterns formed on a surface 1 and a surface 2 with different chemical characteristics. Moreover, a polymer mutually soluble into a first polymer chain or a second polymer chain, or a second polymer block copolymer is mixed in specific proportions with a polymer block copolymer in which the polymer block copolymer composition consists of a first polymer block chain and a second polymer block chain.
申请公布号 JP2013129836(A) 申请公布日期 2013.07.04
申请号 JP20130000291 申请日期 2013.01.07
申请人 HITACHI LTD 发明人 YOSHIDA HIROSHI;TADA YASUHIKO
分类号 C08L53/00;B32B38/00;B82Y40/00;C08F293/00;G03F7/20;H01L21/027 主分类号 C08L53/00
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