发明名称 Semiconductor transistors having reduced distances between gate electrode regions
摘要 A semiconductor structure. The semiconductor structure includes: a semiconductor substrate which includes a top substrate surface which defines a reference direction perpendicular to the top substrate surface and further includes a first semiconductor body region and a second semiconductor body region; a first gate dielectric region and a second gate dielectric region on top of the first and second semiconductor body regions, respectively; a first gate electrode region on top of the semiconductor substrate and the first gate dielectric region; a second gate electrode region on top of the semiconductor substrate and the second gate dielectric region; and a gate divider region in direct physical contact with the first and second gate electrode regions. The gate divider region does not overlap the first and second gate electrode regions in the reference direction.
申请公布号 US8476717(B2) 申请公布日期 2013.07.02
申请号 US201213357757 申请日期 2012.01.25
申请人 WONG ROBERT C.;YANG HAINING S.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 WONG ROBERT C.;YANG HAINING S.
分类号 H01L27/088;H01L27/118 主分类号 H01L27/088
代理机构 代理人
主权项
地址