发明名称 |
METHOD FOR MANUFACTURING TARGET GENERATED CHARGED PARTICLE, TARGET STRUCTURE AND TREATMENT APPARATUS USING THE SAME |
摘要 |
PURPOSE: A manufacturing method of a target for generating charged particle, a target structure, and a treatment apparatus using the same are provided to generate charged particle with high energy. CONSTITUTION: A manufacturing method of a target for generating charged particle comprises a step of forming a source layer(12) on a substrate(10); a step of forming balls(13) on the source layer; a step of forming a metal thin film(14) on the source layer; and a step of forming holes exposing the source layers form the metal thin film, by removing the balls. The target comprises a substrate; a source layer formed on the substrate; and a metal thin film having holes locally exposing the source layer.
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申请公布号 |
KR20130070186(A) |
申请公布日期 |
2013.06.27 |
申请号 |
KR20110137392 |
申请日期 |
2011.12.19 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
PARK, HYUNG JU;PYO, HYEON BONG;CHO, SEONG MOK;JUNG, MOON YOUN;KIM, SEUNG HWAN |
分类号 |
A61N5/10;A61N5/00 |
主分类号 |
A61N5/10 |
代理机构 |
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主权项 |
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地址 |
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