| 摘要 |
PURPOSE: A photosensitive resin composition for forming spacer is provided to have excellent transparency as well as resilience rate, less modify in outside pressure by including oxen ester group photo initiator of specific structures. CONSTITUTION: A photosensitive resin composition for forming a spacer comprises oxime ester group photo initiator which is indicated as chemical formula 1. R1 is alkyl group of carbon number 1-10. R2 and R3 are independently a hydrogen atom, halogen atom, or an alkyl group of carbon number 1-10. The photosensitive resin composition for forming a spacer also comprises at least one photo initiator selected from a group of trainee group compound, acetophenone based compound, biimidazol-based compound, oxym group compound, benzene group compound, benzophenone group compound, thioxanthone compound and anthracene compound. |
