| 摘要 |
PURPOSE: A liquid crystal display device and a liquid crystal display production method are provided to increase opening ratio by forming contact holes on the top of a thin film transistor. CONSTITUTION: The first contact hole(161) is overlapped with a drain electrode(142), a gate electrode(120), and an oxide semiconductor layer(130) and the surface of the drain electrode is exposed penetrating the first insulating layer(155). Therefore, 'the oxide semiconductor layers that are strong at dry etching' has a barrier role when etching for the generation of contact holes(162,163).
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