| 摘要 |
PURPOSE: An array substrate for FFS(Fringe-Field Switching) liquid crystal display devices and a manufacturing method thereof are provided to form a gate line and a pixel electrode with a single mask, form an active layer, a source electrode, and a drain electrode with a single mask, and omit a process of forming a gate insulating layer, thereby manufacturing an FFS liquid crystal display device with four mask processes. CONSTITUTION: A gate line, a gate electrode(106b), and a pixel electrode(103a) are formed by etching the side parts of a first and a second transparent conductive material layer pattern part by using a photosensitive insulating layer pattern(107a) as an etching mask. An active layer(113a) and an ohmic contact layer(115a) are formed by successively etching a second conductive metal layer, an amorphous silicon layer containing impurities, and an amorphous silicon layer by using a first and a second pattern part of a second photoresist as an etching mask. A source electrode(117b) and a drain electrode(117c) are formed by etching the exposed part of the second conductive metal layer by using the first pattern part as an etching mask. |
