发明名称 |
METHOD FOR THE TREATMENT OF TECHNICALLY PURE HALOSILANES FROM ELEMENTS OF THE THIRD MAIN GROUP AND INSTALLATION FOR CARRYING OUT SAID METHOD |
摘要 |
The invention relates to a method for reducing the content in elements of the third main group of the periodic system, especially in boron-and/or aluminum-containing compounds of technically pure halosilanes for producing purified halosilanes, especially high-purity chlorosilanes and they are treated with triphenylmethylchloride and mechanical separation of settled complexes are carried out. |
申请公布号 |
UA102239(C2) |
申请公布日期 |
2013.06.25 |
申请号 |
UA20100010057 |
申请日期 |
2008.11.20 |
申请人 |
EVONIK DEGUSSA GMBH |
发明人 |
MUH, EKKEHARD;RAULEDER, HARTWIG;SCHORK, REINHOLD |
分类号 |
C01B33/107 |
主分类号 |
C01B33/107 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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