发明名称 APPARATUS FOR TREATING PROCESSING WASTE LIQUID
摘要 <P>PROBLEM TO BE SOLVED: To provide an apparatus for treating processing waste liquid in which fine silicon particles can be separated from processing waste liquid including the fine silicon particles as cutting dust or grinding dust to generate clear water, and the fine silicon particles can be efficiently recovered. <P>SOLUTION: The apparatus for treating the processing waste liquid separates the processing waste liquid with the fine silicon particles being mixed therein into the fine silicon particles and the clear water, and includes a waste liquid treatment tank for treating the processing waste liquid, and a silicon separating mechanism for separating the fine silicon particles from the processing waste liquid stored in the waste liquid treatment tank. The waste liquid treatment tank is provided with a processing waste liquid inlet port in one end wall in a longitudinal direction and a clear water outlet port in the other end wall. The silicon separating mechanism includes a plurality of negative potential plates arranged in parallel one another at a distance along the longitudinal direction in the waste liquid treatment tank, and a positive potential plate unit having a plurality of positive potential plates arranged to face the plurality of the negative potential plates, wherein the positive potential plate unit is detachable. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013123781(A) 申请公布日期 2013.06.24
申请号 JP20110274694 申请日期 2011.12.15
申请人 DISCO CORP 发明人 YOSHIDA MIKI;ISHIGURO HIROTAKA
分类号 B24B55/12;B23Q11/00 主分类号 B24B55/12
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