发明名称 |
METHOD AND APPARATUS FOR REDUCING CONTAMINATION OF SUBSTRATE |
摘要 |
An aligner, chuck, and end effector for substrate processing are provided. The aligner includes a rotatable substrate support having a surface for supporting the substrate. The rotatable substrate support has a diameter less than a diameter of the substrate and surfaces of the rotatable substrate support are coated with a coating consisting essentially of a poly(p-xylylene) polymer. The chuck includes a flat platform that supports the substrate during processing. The chuck is larger than the substrate and may include holes though which lift pins can pass assist the loading/unloading of the substrate. The end effector includes an arm supporting a first extension and a second extension, wherein the arm, the first extension and the second extension are coated with a coating consisting essentially of a poly(p-xylylene) polymer.
|
申请公布号 |
US2013156530(A1) |
申请公布日期 |
2013.06.20 |
申请号 |
US201113325232 |
申请日期 |
2011.12.14 |
申请人 |
SCULAC ROBERT;FRANCIS AARON;KAHLON SATBIR;SWORD LE MARIOUS;INTERMOLECULAR, INC. |
发明人 |
SCULAC ROBERT;FRANCIS AARON;KAHLON SATBIR;SWORD LE MARIOUS |
分类号 |
H01L21/677;B23Q1/25;B25J11/00;B25J15/00 |
主分类号 |
H01L21/677 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|