| 摘要 |
<p>A detection method for a space imaging overlay and an array substrate are provided. The method comprises: photoetching to form a layer of thin film with a space imaging overlay mark; developing the space imaging overlay mark on the transparent thin film when the thin film is a transparent thin film, so that the space imaging overlay mark shows opaque; and carrying out a space imaging overlay detection between the transparent thin film and an adjacent thin film by utilizing the opaque space imaging overlay mark. The method can quickly and exactly locate the space imaging overlay mark, and thus can quickly and effectively detect the alignment situation of two photoetching processes, by development and then location of a space imaging overlay mark on a transparent thin film.</p> |
