| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and apparatus for depositing a functional thin film with excellent crystallinity even if the film is thick, while fully exhibiting the characteristics as a functional thin film. <P>SOLUTION: The method for depositing a functional thin film on a substrate by a vapor phase thin film deposition method, includes heating a film deposition side of the substrate to deposit the functional thin film. The device 1 for depositing the functional thin film on the substrate by the vapor phase thin film deposition method, includes a heating means for heating the film deposition side of the substrate. The vapor phase thin film deposition method is a laser deposition method. <P>COPYRIGHT: (C)2013,JPO&INPIT |
