<p>PURPOSE: A nano imprint lithography apparatus and a nano imprint lithography method are provided to secure an alignment system for removing the fractional error and the scale error between a stamp and a substrate. CONSTITUTION: A stamp(130) includes a main body(302), pillars(202), and an actuator(204). A pattern(135) is formed in the first surface of the main body. The pillars are formed in the second surface of the main body. The actuator applies force to the pillars to generate deformation. A control unit adjusts the actuator.</p>
申请公布号
KR20130063233(A)
申请公布日期
2013.06.14
申请号
KR20110129648
申请日期
2011.12.06
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
CHO, YOUNG TAE;PARK, EUN AH;LEE, SUNG HOON;LEE, SOON WON