| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize uniform processing of a substrate. <P>SOLUTION: A spin processing apparatus 1 rotates a substrate W to perform processing on the substrate W and includes: a rotor 4a rotatably provided; at least three substrate support members 4f which are provided at a predetermined interval in the rotation direction of the rotor 4a so as to move up and down and support a peripheral part of the substrate W; at least three clamp pins 21 which are provided at a predetermined interval in the rotation direction of the rotor 4a so as to eccentrically rotate and come in contact with an outer peripheral surface of the substrate W through eccentric rotation to hold the substrate W; a lifting mechanism moving up and down the three substrate support members 4f in a synchronized manner; and a rotation mechanism eccentrically rotating the three clamp pins 21 in a synchronized manner. <P>COPYRIGHT: (C)2013,JPO&INPIT |
