发明名称 |
LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.
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申请公布号 |
US2013149649(A1) |
申请公布日期 |
2013.06.13 |
申请号 |
US201213693923 |
申请日期 |
2012.12.04 |
申请人 |
POLET THEODORUS WILHELMUS;COX HENRIKUS HERMAN MARIE;VAN DER HAM RONALD;SIMONS WILHELMUS FRANCISCUS JOHANNES;VAN DE WINKEL JIMMY MATHEUS WILHELMUS;CORCORAN GREGORY MARTIN MASON;VAN BOXTEL FRANK JOHANNES JACOBUS;ASML NETHERLANDS B.V. |
发明人 |
POLET THEODORUS WILHELMUS;COX HENRIKUS HERMAN MARIE;VAN DER HAM RONALD;SIMONS WILHELMUS FRANCISCUS JOHANNES;VAN DE WINKEL JIMMY MATHEUS WILHELMUS;CORCORAN GREGORY MARTIN MASON;VAN BOXTEL FRANK JOHANNES JACOBUS |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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