SIMULATION METHOD, SIMULATION PROGRAM, SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a simulation method which allows for accurate prediction of the amount of damage of ultraviolet ray on a film.

SOLUTION: The simulation method for predicting the amount of damage due to ultraviolet ray is executed in the manufacturing of a semiconductor device from a predicted emission spectrum of an ultraviolet region, by calculating a prediction formula of light emission intensity of each wavelength in the ultraviolet region associated with the emission spectrum of a visible region by multivariate analysis, and then predicting the emission spectrum of the ultraviolet region by using the prediction formula thus calculated and the emission spectrum of a visible region detected actually.

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