SUBSTRATE, MANUFACTURING METHOD THEREOF AND INKJET PRINT HEAD

摘要

PURPOSE: A silicon substrate, a manufacturing method thereof, and an inkjet print head are provided to enable to remove a faulty etch profile portion generated in a dry etching process of the silicon substrate and to improve a shape of an ink flow path. CONSTITUTION: A silicon substrate(200) comprises a first connection unit(210), a second connection unit(220), and a restrictor unit(230). The first connection unit is connected to a manifold and has the first width(W1) of first size. The second connection unit is connected to a pressure chamber and has the second width(W2) of second size. The restrictor unit connects the first and second connection units and has the third width(W3) of third size smaller than the first or the second size. Boundary portions(250,252), where the restrictor unit and the first connection unit or the restrictor unit and the second connection unit are connected, are formed into a curved shape.