| 摘要 |
<p>A direct resistance heating apparatus (10;20;40;50) includes a first electrode (11;21;41;51) and a second electrode (12;22;42;52), and a moving mechanism (15;25;45;55) configured to move at least one of the first electrode (11;21;41;51) and the second electrode (12;22;42;52). A direct resistance heating method includes steps of providing a workpiece (w) having a heating target region, a resistance of which per unit length in one direction thereof varying along the one direction, placing a first electrode (11;21;41;51) and a second electrode (12;22;42;52) on the heating target region, and moving at least one of the first electrode (11;21;41;51) and the second electrode (12;22;42,52) such that a time during which the electric current is applied to each part of the heating target region is adjusted in accordance with a change of the resistance per unit length, thereby heating the workpiece (w) such that the each part of the heating target region is heated to a temperature within a target temperature range.</p> |
