| 摘要 |
<p>The invention relates to a cleaning apparatus (1) for removing liquid or solid impurities (6) from a gas flow (5), comprising a housing (2) which has at least one dirty-side inlet (3) and at least one clean-side outlet (4), and comprising a separating plate (7) which is arranged within the housing (2) and extends essentially transverse to the gas flow (5), serves as a baffle plate for the arriving gas flow (5) and separates a first space (8) from a second space (9) in the housing (2). An improved cleaning action results when a first lateral boundary wall (11) of the first space (8) contains at least one flow nozzle (12) through which the gas flow (5) can flow over from the first space (8) into the second space (9), and when a second lateral boundary wall (13) of the second space (9) is arranged at a distance opposite the respective flow nozzle (12) and serves as a baffle plate toward which the gas flow (5) leaving the respective flow nozzle (12) flows.</p> |
