发明名称 CHEMICAL SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS PROVIDED WITH SAME, AND APPLICATION/DEVELOPMENT SYSTEM PROVIDED WITH THE SUBSTRATE PROCESSING APPARATUS
摘要 <p>A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.</p>
申请公布号 KR20130057984(A) 申请公布日期 2013.06.03
申请号 KR20127027167 申请日期 2011.03.16
申请人 TOKYO ELECTRON LIMITED 发明人 FURUSHO TOSHINOBU;OOKUBO TAKAHIRO;YOSHIHARA KOUSUKE;YAMAMOTO YUSUKE;HORNIG STEFFEN
分类号 H01L21/027;B01D35/26;B05C11/10 主分类号 H01L21/027
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