LARGE AREA SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A large area substrate processing apparatus is provided to improve the uniformity of a thin film by using an injector assembly which moves horizontally to form a thin film. CONSTITUTION: A reaction chamber forms a pumping port(140). A pumping plate(10) is divided into a reaction space and a pumping space. An injector assembly(30) is adjacent to the pumping plate. The injector assembly has injector modules. An injector movement module reciprocates the injector assembly in a first direction.