发明名称 |
Re-flow and buffer system for immersion lithography |
摘要 |
A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.
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申请公布号 |
US8451422(B2) |
申请公布日期 |
2013.05.28 |
申请号 |
US20090388900 |
申请日期 |
2009.02.19 |
申请人 |
SEWELL HARRY;BIJLAART ERIK THEODORUS MARIA;DONDERS SJOERD NICOLAAS LAMBERTUS;MARKOYA LOUIS JOHN;MCCAFFERTY DIANE;MEIJERS RALPH JOSEPH;ASML NETHERLANDS B.V.;ASML HOLDING NV |
发明人 |
SEWELL HARRY;BIJLAART ERIK THEODORUS MARIA;DONDERS SJOERD NICOLAAS LAMBERTUS;MARKOYA LOUIS JOHN;MCCAFFERTY DIANE;MEIJERS RALPH JOSEPH |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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