| 摘要 |
PURPOSE: A method for cleaning a mask for OLED device deposition is provided to reduce cleaning time by using a treatment furnace for removing an organic material remaining on a mask. CONSTITUTION: Melted NaOH is obtained(S11). A mask to be washed is preheated(S12). The surface of the preheated mask is washed(S13). The washed mask is cooled(S14). The mask is washed using cleaning water(S15). [Reference numerals] (S11) Prepare melted NaOH; (S12) Preheat a mask in 100-200°C; (S13) Wash the preheated mask by the melted NaOH; (S14) Cool the washed mask under 100°C; (S15) Wash by cleaning water
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