发明名称 Methods and Apparatus of Packaging Semiconductor Devices
摘要 Methods and apparatuses for wafer level packaging (WLP) semiconductor devices are disclosed. A redistribution layer (RDL) is formed on a first passivation layer in contact with a conductive pad over a surface of a die. The RDL layer is on top of a first region of the first passivation layer. A second passivation layer is formed on the RDL layer with an opening to expose the RDL layer, and over the first passivation layer. An under bump metallization (UBM) layer is formed over the second passivation layer in contact with the exposed RDL layer. A second region of the first passivation layer disjoint from the first region is determined by projecting an outer periphery of a solder ball or other connector onto the surface.
申请公布号 US2013127052(A1) 申请公布日期 2013.05.23
申请号 US201113302551 申请日期 2011.11.22
申请人 TU CHIA-WEI;KUO YIAN-LIANG;TSAI TSUNG-FU;HUANG RU-YING;SHEU MING-SONG;CHEN HSIEN-WEI;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 TU CHIA-WEI;KUO YIAN-LIANG;TSAI TSUNG-FU;HUANG RU-YING;SHEU MING-SONG;CHEN HSIEN-WEI
分类号 H01L23/498;H01L21/60 主分类号 H01L23/498
代理机构 代理人
主权项
地址