| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a film member which can form a film body having higher characteristics. <P>SOLUTION: The method for producing a film member 10 includes a formation step of forming a film body 12 on the member 11 to be treated by sputtering treatment using a sputtering target member(s). In the formation step, treatment of forming the film body 12 including the elements of Mg, Al, O and N on the surface of the member 11 to be treated is performed using one or a plurality of sputtering target members. In this case, the sputtering target member(s) may have any form if only all of Mg, Al, O and N are included, and one kind of sputtering target member may be used, and a plurality of sputtering target members may be used. Mg, Al, O and N are included in the film body 12 formed on the member 11 to be treated. <P>COPYRIGHT: (C)2013,JPO&INPIT |
