| 摘要 |
PURPOSE: A metal organic chemical vapor deposition apparatus is provided to facilitate manufacturing using covers and a gas guide member. CONSTITUTION: A lid assembly covers the upper part of a reactor body. A susceptor(130) is arranged in the reactor body. An air outlet is formed in the central part of the susceptor. A gas guide member(140) is guided to the central part of the reactor body. A heating member(150) heats the susceptor.
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